A common commercial process for the production of so-calledElectronic Grade Silicon (EGS) is the Siemens process (see figurebelow). EGS is of ultra-high purity, enough to be used forfabrication of microchips. The Siemens process is a chemical vapordeposition (CVD) reactor. In CVD, feed gases pass over a heatedsubstrate and decompose to deposit a thin solid film on thesubstrate. In the Siemens process, a chamber contains a heatedsilicon rod. An ultra-high purity gas mixture of trichlorosilaneand hydrogen flows over the rod. Pure silicon deposits on the rodas a poly-crystalline solid. (Single crystals of silicon, neededfor microchip fabrication, are later made by melting the EGS anddrawing a single crystal from the melt.) The CVD reaction isH2(gas) + SiHCl3(gas) ? Si(solid) + 3HCl(gas) The rod initially hasa mass of 1460 g and the mole fraction of hydrogen in the reactorfeed and the exit gas is 0.580 and 0.223, respectively. The feedenters at a rate of 6.22 Kmol/hr. Assuming steady-state, what willbe the mass of the rod at the end of 20 mins?
Use the order calculator below and get started! Contact our live support team for any assistance or inquiry.
[order_calculator]